WaveMaster® PRO 2 / PRO 2 Wafers are Fully Automated Wavefront Measurement Systems with Shack-Hartmann Sensors for Series Testing of Lenses and Optical Wafers.
The quality and efficiency requirements placed on the mass production of small plastic or glass lenses, optical windows are continually rising. The use of wavefront measurement technology in mass production can yield a great deal of optimization potential.
WaveMaster® PRO 2 & PRO 2 Wafer set new standards in the series testing of optics and optical wafers. With a typical measurement time of 2 sec. per optic and a fast tray or wafer change, the prerequisites are met for use in mass production. With respect to measurement technology, WaveMaster® PRO 2 & PRO 2 Wafer determine with a Shack-Hartmann sensor the wavefront from which various parameters are derived. A comparison to the design data is then performed per lens. A very good data pool for additional optimizations in production.
Tray for the measurement of lenses
Key Features:
- Measurement duration: less than 2 seconds per lens
- Full automatic measurement of large amounts of samples (wafer or preloaded trays)
- User selectable PASS and FAIL criteria
- Absolute or relative wavefront measurement
- Complete Wavefront analysis (PV, RMS, Zernike, PSF, MTF, Strehl)
- Available in two setups
- Setup for the measurement of spherical and aspherical lenses (single lenses or wafer)
- Setup for the measurement of flat surfaces (single surface or wafer)
- Export of all measurement results for each single lens
- Option: Integrated measurement system for the measurement of wafer orientation, overall wafer bow and tilt
Applications:
Quality control of:
- Spherical or aspherical lenses
- Optical windows
- Filters
- Optical Wafers
With Shack-Hartmann sensors in series production:
- Comparison with design data using the Zernike coefficients
- Direct comparison to master samples
- Determine imaging quality (MTF), material defects and production errors using wavefront analysis
- Wedge Angle (option)
- EFL (option)
Wavefront Measurement of Wafers and Single Lenses on a Tray
he WaveMaster® software is clearly structured, easy to use and contains all functions to measure and analyze the sample with the WaveMaster® instruments. It has an additional module for the WaveMaster® PRO 2 and WaveMaster® PRO 2 Wafer production systems.
The software communicates with the Shack-Hartmann sensor and analyzes the measured wavefront in real time. In addition, it controls the WaveMaster® instruments.
Advantages of the Software:
- Automatic pass or fail results based on a multitude of freely selectable criteria
- Real-time measurement and analysis of wavefront
- Display of wavefront, PV and RMS, intensity map and live camera image
- Wavefront correction for Zernike tilt and defocus coefficients
- Adjustable masking of measurement area
- Circular, rectangular and elliptical masking
- Display of live camera image in mask editor
- Certificate saving
- Camera image averaging
- User account log-in with different levels of user rights
- The whole system is software controlled
| WaveMaster® PRO 2 | Measurement of optics in a tray |
| WaveMaster® PRO 2 Wafer | Measurement of optical wafers |
| Measurement configuration for the measurement of aspherical or spherical optics | Setup for the measurement in transmission with point ligth source |
| Measurement configuration for the measurement of plane surfaces | Setup for the measurement in transmission with collimated light source |
| Clear aperture of samples | 0.5 mm … 14 mm (depends on imaging optics) |
| EFL (Measurement configuration) | -12 mm to +50 mm Measurement time per optic |
| Sample throughput per hour | ≥ 1800 lenses |
| Lenses per tray | Max. 148 |
| Exchange time for tray of lenses | 10 s |
| Wafer tray exchange time, incl. alignment | < 2 min |
| Setup time for new lens design | < 5 min |
| Sample holder | Tray or wafer chuck |
| Wavelength | 532 nm, 635 nm (others on request) |
| Wavefront accuracy | < λ/20 (RMS) |
| Wavefront repeatability | < λ /200 (RMS) |
| Dynamic range | > 2000 λ |
| Measurement frequency | Up to 12 Hz |
| Lateral resolution | > 138x138 microlenses |
