WaveSensor & WaveMaster®
Shack-Hartmann wavefront sensors
To ensure the implementation of the complex optical designs after production, a qualified measuring technology must be used. Wavefront measurement is particularly well-suited for this purpose, since it determines the image quality on a spatially-resolved basis, i.e. over all field angles, and across the entire sample aperture. In contrast to traditional MTF testing, this not only results in a point-based measure of quality, but also in a continuous alignment across the entire aperture.
High flexibillity
With a maximum dynamic range of up to 2000 λ, WaveSensor and WaveMaster® allow high flexibility in the lens design to be measured.
Repeatable high precision
In addition to a measuring accuracy of up to λ/20 (RMS), a high repeatability of λ/200 (RMS) can also be achieved due to the compact, robust and vibration-resistant design.
Immediate evaluation
In real time, the results of the measured wavefront data are compared and evaluated with those of the sample lenses or the design values.
Products
These sensors analyze entire optical arrangements or individual surfaces in real time, delivering the determination of the wavefront (PV, RMS), the Zernike coefficients, the Point Spread Function (PSF), the Modulation Transfer Function (MTF), the Strehl ratio, the radius of curvature and the aspherical coefficients. They thereby enable conclusions to be drawn not only about quality control, but also about the production process.
More information
WaveSensor represents the foundation of wavefront measurement and analysis of spherical, aspherical, freely shaped and flats single lenses and lens systems at TRIOPTICS. It involves a Shack-Hartmann sensor that is used both individually as well as integrated in complete measurement systems.
As a result of their simple operation and flexibility, the measurement systems of the WaveMaster® Compact series and the WaveMaster® Plan, with its multiple degrees of freedom, are optimized for use in research and development and the random sample quality testing of single lenses. Analyses are performed over the surface and/or the entire optical assembly.
With the WaveMaster® PRO 2, TRIOPTICS offers a measurement system that is optimized for use in production and offers batch measurements. For applications where mere on-axis wavefront measurements are not sufficient because high field angles are not taken into account, WaveMaster® Filed and WaveMaster® UST offer solutions.
As a result of their simple operation and flexibility, the measurement systems of the WaveMaster® Compact series and the WaveMaster® Plan, with its multiple degrees of freedom, are optimized for use in research and development and the random sample quality testing of single lenses. Analyses are performed over the surface and/or the entire optical assembly.
With the WaveMaster® PRO 2, TRIOPTICS offers a measurement system that is optimized for use in production and offers batch measurements. For applications where mere on-axis wavefront measurements are not sufficient because high field angles are not taken into account, WaveMaster® Filed and WaveMaster® UST offer solutions.
WaveMaster® PRO 2 / PRO 2 Wafer / PRO 2 PLAN
Serial testing of lens and wafers
WaveMaster® PRO 2 is used for series testing of lens assemblies and optical wafers.
- Fully automatic measurement of high sample volumes (wafers or loaded trays)
- Measurement time of less than 3 seconds per lens and measurement step provides for high sample throughput
- High repeatability
More information
- User-defined pass/fail criteria for application-oriented quality control, in comparison to design data or master samples
- High transparency of measurement results through the export of measurement data of each individual lens enables optimal production control with respect to material defects and production errors
WaveMaster® Field
Off-axis wavefront measurement
The WaveMaster® Field is designed for testing single lenses and objectives under high field angles.
- Universal wavefront inspection at field angles of up to 60°
- Flexible and simple adjustment of individual angles of incidence and wavelengths
- Variable sample holder allows adaptation to different sample types – ideal for R&D
More information
- Characterization of samples using the following lens parameters: EFL, MTF, distortion, Zernike analysis
Downloads
Software
WaveSensor or WaveMaster® Software
The software is comprehensively structured, user friendly and includes all of the functions required to measure and analyze spherical and aspherical samples with a WaveSensor® or WaveMaster®. As a result of their flexible configurability, all important measurement results are displayed.
The software communicates with the Shack-Hartmann sensor and analyzes the measured wavefront in real time. In addition, the WaveMaster® controls measurement systems in order to align samples, for example.
- Clear, menu-guided and configurable operation
- Simple and intuitive measurement and analysis of wavefronts of the entire lens assembly or on surfaces in real time
- One software for everything: Data acquisition, data calculation, calibration and display of data
- Absolute and relative measurement mode for instant comparison with the theoretical design data from ZEMAX and Code V or with a reference lens
- Complete documentation through output of measurement certificates
- Clear depiction in adjustable measurement and analysis range of
- 2D wavefront
- PV and RMS
- Intensity
- Camera image
- Complete depiction of surface topography through multiple parameterizations:
- Aspherical equation
- Zernike polynomials
- Conical equation
- Spherical equation
- Free-form surface
Upgrades
All of the WaveMaster® systems feature a flexible design and can thus be adapted to the specific requirements of your application.
A complete analysis is possible by an individual adjustment to the sample. Kinematic mounts enable the simple exchange of light sources and telescopes.
- Light sources with different wavelength and numerical aperture
- Telescopes for achieving optimal magnification between sample and sensor
- Lens assemblies for surfaces with different radii of curvature
- Sample holders and trays
- Reference samples
The software function is optimized by means of specific modules with regard to the measurement task:
ZERNIKE analysis module
- Zernike fit and analysis of the wavefront in real time
- Numerical and graphical display of fit results and residuals
- Import of wavefront design data from ZEMAX and CODE V for real-time comparisons
- Export of wavefront data and analysis results in ASCII and ZEMAX format
MTF/PSF analysis module
- Real-time calculation and display of 3D MTF and PSF data
- Table with MTF measurement results
- Export function for measurement results
- Calculation of Strehl ratio
- Extension of the measurement range
- Upgrade for toric lenses (automated marker detection, simplified measurement of MTF, visual inspection)
- Upgrade for 546 nm
- Lens holder with various aperture sizes
- Model eye, optional heatable
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